TEMPERATURE-DEPENDENCE OF THE STEP STRUCTURE OF VICINAL SI(001) SURFACES

被引:24
|
作者
AUMANN, CE [1 ]
DEMIGUEL, JJ [1 ]
KARIOTIS, R [1 ]
LAGALLY, MG [1 ]
机构
[1] UNIV AUTONOMA MADRID,DEPT FIS MAT CONDENSADA,E-28049 MADRID,SPAIN
基金
美国国家科学基金会;
关键词
D O I
10.1016/0039-6028(92)90643-K
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Si(001) surfaces miscut slightly towards the [110] direction consist of alternating domains of (1 x 2) and (2 x 1) reconstruction, separated by inequivalent, single-atomic-height steps; at higher miscut angles, the surface is mainly monodomain, with terraces separated by double-atomic-height steps. High-resolution low-energy electron diffraction has been used to determine the step structure of vicinal Si(001) as a function of both temperature and miscut angle. The concentration of double-atomic-height steps continuously increases with miscut angle and, for vicinalities greater than approximately 2-degrees, decreases with increasing temperature. From a comparison of the experimental results with the predictions of a one-dimensional model treating the problem in terms of chemical equilibrium in a two-component system we obtain information on the energetics of the structure transformation.
引用
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页码:1 / 15
页数:15
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