TUNNELING OF X-POINT ELECTRONS IN TRIPLE BARRIER DIODES

被引：1
|
作者：
NAKAGAWA, T
KOJIMA, T
OHTA, K
机构：
来源：
JOURNAL OF CRYSTAL GROWTH | 1989年 / 95卷 / 1-4期
关键词：
D O I：
10.1016/0022-0248(89)90417-X
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
引用
收藏
页码：357 / 359
页数：3
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