PREPARATION OF VANADIUM-OXIDE THIN-FILMS BY RADIOFREQUENCY MAGNETRON SPUTTERING

被引：0
|
作者：
OH, YS
WATANABE, Y
TAKATA, M
机构：
来源：
NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN | 1992年 / 100卷 / 12期
关键词：
SPUTTERING; THIN FILMS; VANADIUM OXIDES; SINGLE-PHASE FILMS;
D O I：
暂无
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Vanadium oxide thin films were prepared by radio-frequency magnetron sputtering in a mixed Ar-O2 atmosphere using a vanadium metal powder as the sputtering target. The composition and structure of these films were investigated by X-ray photoelectron spectroscopy and X-ray diffraction measurement. The films deposited at room temperature were found to be amorphous. When the substrate temperature was over 200-degrees-C, crystalline films were obtained. The single-phase films of V, VO2, V4O9 and V2O5 were obtained by controlling the oxygen concentration in the Ar-O2 gas atmosphere.
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页码：1390 / 1393
页数：4
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