THE EFFECTS OF BOND STRAIN ON THE PROPERTIES OF PLASMA-DEPOSITED SILICON-OXIDE FILMS

被引：3
|
作者：
MACHONKIN, MA
JANSEN, F
机构：
[1] Xerox, Webster, NY, USA, Xerox, Webster, NY, USA
来源：
THIN SOLID FILMS | 1987年 / 150卷 / 2-3期
关键词：
D O I：
10.1016/0040-6090(87)90110-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
9
引用
收藏
页码：L97 / L99
页数：3
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