PLASMA ANODIZATION OF GERMANIUM

被引：13
|
作者：
OHANLON, JF
机构：
来源：
APPLIED PHYSICS LETTERS | 1969年 / 14卷 / 04期
关键词：
D O I：
10.1063/1.1652743
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：127 / &
相关论文
共 50 条
  • [1] PLASMA ANODIZATION OF SILICON
    HO, VQ
    SUGANO, T
    JAPAN ANNUAL REVIEWS IN ELECTRONICS COMPUTERS & TELECOMMUNICATIONS, 1983, 8 : 73 - 84
  • [2] PLASMA ANODIZATION OF TITANIUM AND MOLYBDENUM
    KNORR, K
    LESLIE, JD
    THIN SOLID FILMS, 1974, 23 (01) : 101 - 107
  • [3] KINETICS OF PLASMA ANODIZATION OF ALUMINUM
    PROPP, M
    YOUNG, L
    PULFREY, DL
    OLIVE, G
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (06) : 891 - 897
  • [4] APPARATUS FOR PLASMA ANODIZATION EXPERIMENTS
    NYCE, AC
    SHAPIRO, MI
    SKOLNICK, LP
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1974, 45 (09): : 1119 - 1121
  • [5] DC PLASMA ANODIZATION OF GAAS
    CHESLER, LA
    ROBINSON, GY
    APPLIED PHYSICS LETTERS, 1978, 32 (01) : 60 - 62
  • [6] KINETICS OF GAAS PLASMA ANODIZATION
    FRIEDEL, P
    GOURRIER, S
    DIMITRIOU, P
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (09) : 1857 - 1861
  • [7] ANODIZATION OF SI IN AN RF PLASMA
    PULFREY, DL
    HATHORN, FGM
    YOUNG, L
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (11) : 1529 - 1535
  • [8] FORMING VOLTAGE IN PLASMA ANODIZATION
    RAMASUBR.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (07) : 949 - +
  • [9] PLASMA ANODIZATION OF METALS AND SEMICONDUCTORS
    OHANLON, JF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (02): : 330 - &
  • [10] MODEL OF PLASMA ANODIZATION OF METALS AND SEMICONDUCTORS
    LABUNOV, V
    PARKHUTIK, V
    TKHAREV, E
    JOURNAL OF CRYSTAL GROWTH, 1978, 45 (01) : 399 - 403
12345