MPI MS DETECTION OF SIF AND SIF2 RADICALS PRODUCED FROM THE REACTION OF F2 AND NF3 WITH SILICON

被引：25
|
作者：
DAGATA, JA
SQUIRE, DW
DULCEY, CS
HSU, DSY
LIN, MC
机构：
来源：
CHEMICAL PHYSICS LETTERS | 1987年 / 134卷 / 02期
关键词：
D O I：
10.1016/0009-2614(87)87112-9
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：151 / 155
页数：5
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