OXIDE FILMS ON TIN PLATE

被引:0
|
作者
FALKENHAGEN, M
BODE, JD
机构
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:C178 / C178
页数:1
相关论文
共 50 条
  • [1] DETERMINATION OF OXIDE FILMS ON TIN PLATE
    WILLEY, AR
    KELSEY, DF
    ANALYTICAL CHEMISTRY, 1958, 30 (11) : 1804 - 1806
  • [2] STRUCTURE OF TIN OXIDE FILMS
    PENEVA, SK
    RUDARSKA, RK
    TSUKEVA, EA
    ACTA CRYSTALLOGRAPHICA SECTION A, 1978, 34 : S379 - S379
  • [3] Preparation of indium tin oxide films and doped tin oxide films by an ultrasonic spray CVD process
    Zhou, ZB
    Cui, RQ
    Pang, QJ
    Wang, YD
    Meng, FY
    Sun, TT
    Ding, ZM
    Yu, XB
    APPLIED SURFACE SCIENCE, 2001, 172 (3-4) : 245 - 252
  • [4] Electrical and optical properties of tin oxide and antimony doped tin oxide films
    Jain, G
    Kumar, R
    OPTICAL MATERIALS, 2004, 26 (01) : 27 - 31
  • [5] MIXED-OXIDE FILMS ON TIN
    GABE, DR
    SURFACE TECHNOLOGY, 1977, 5 (06): : 463 - 478
  • [6] CONTRIBUTIONS TO STUDY OF TIN OXIDE FILMS
    VISCRIAN, I
    GEORGESC.V
    THIN SOLID FILMS, 1969, 3 (02) : R17 - &
  • [7] RF aerosol plasma fabrication of indium tin oxide and tin oxide thin films
    Lee, DH
    Vuong, KD
    Williams, JAA
    Fagan, J
    Condrate, RA
    Wang, XW
    JOURNAL OF MATERIALS RESEARCH, 1996, 11 (04) : 895 - 903
  • [8] CHARACTERIZATION OF INDIUM TIN OXIDE-FILMS
    MURALI, KR
    SAMBASIVAM, V
    JAYACHANDRAN, M
    CHOCKALINGAM, MJ
    RANGARAJAN, N
    VENKATESAN, VK
    SURFACE & COATINGS TECHNOLOGY, 1988, 35 (1-2): : 207 - 213
  • [9] Properties of tin oxide films prepared by MOCVD
    Choi, GP
    Park, YJ
    Noh, WS
    Park, JS
    DESIGNING, PROCESSING AND PROPERTIES OF ADVANCED ENGINEERING MATERIALS, PTS 1 AND 2, 2004, 449-4 : 997 - 1000
  • [10] Cytocompatibility of novel tin oxide thin films
    N. Rushe
    M. Ball
    W. M. Carroll
    S. Healy
    J. McManus
    D. Cunningham
    Journal of Materials Science: Materials in Medicine, 2005, 16 : 247 - 252