INVENTORSHIP - RIGHTS AND RECOGNITION

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|

作者：

SPATH, TE ^{[1
]}

HOXIE, D ^{[1
]}

机构：

[1] FAITHFULL & HAPGOOD,NEW YORK,NY 10111

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1981年 / 182卷 / AUG期

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中图分类号：

O6 [化学];

学科分类号：

0703 ;

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页码：1 / CINF

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