GAMMA-X TRANSFER RATES IN TYPE-II (AL)GAAS/ALAS SUPERLATTICES

被引:8
|
作者
FELDMANN, J
SATTMANN, R
GOBEL, EO
NUNNENKAMP, J
KUHL, J
HEBLING, J
PLOOG, K
MURALIDHARAN, R
DAWSON, P
FOXON, CT
机构
[1] ZENTRUM MAT WISSENSCH,W-3550 MARBURG,GERMANY
[2] MAX PLANCK INST FESTKORPERFORSCH,W-7000 STUTTGART 80,GERMANY
[3] PHILIPS RES LABS,REDHILL RH1 5HA,SURREY,ENGLAND
关键词
Crystals - Physical Properties - Semiconducting Aluminum Compounds;
D O I
10.1016/0038-1101(89)90300-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have experimentally determined the Γ-X transfer rates in type II GaAs/AlAs short period superlattices as well as in type II AlxGa1-xAs/AlAs superlattices by femtosecond optical pump and probe spectroscopy. Γ-X transfer times in the range from 120 fs up to 22 ps are observed for samples with different GaAs- or AlxGa1-xAs layer-thicknesses. The drastic increase of the transfer times with increasing layer-thickness can be related to a decreasing overlap of the Γ- and X-envelope wavefunctions.
引用
收藏
页码:1713 / 1717
页数:5
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