RAPID THERMAL ANNEALING OF YBACUO FILMS ON SI AND SIO2 SUBSTRATES

被引：23
|
作者：
ASLAM, M
SOLTIS, RE
LOGOTHETIS, EM
AGER, R
MIKKOR, M
WIN, W
CHEN, JT
WENGER, LE
机构：
[1] FORD MOTOR CO,RES STAFF,DEARBORN,MI 48121
[2] WAYNE STATE UNIV,DEPT PHYS,DETROIT,MI 48202
来源：
APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 02期
关键词：
D O I：
10.1063/1.100578
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：153 / 155
页数：3
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