STRAIN AND DEFECTS IN SI/GE SUPERLATTICES FABRICATED ON A SI SUBSTRATE

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作者
MATSUHATA, H
MIKI, K
SAKAMOTO, K
SAKAMOTO, T
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T [工业技术];
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08 ;
摘要
Microstructures of MBE-grown Si12/Ge4 and Si18/Ge6 strained-layer superlattices (SLSs) were investigated using transmission electron microscopy and X-ray diffraction. Results showed that while the Ge/Si interfaces were flat and abrupt, the Si/Ge interfaces were neither flat nor distinct. In a plan-view image, dislocations in the Si substrate regarded as 60 degree type running along the orthogonal [110] directions were observed. V-shaped misfit islands were observed in the Si18/Ge6 SLS, but almost not in the Si12/Ge4 SLS. Shrinkage of the SLSs along the c axis from the ideal SLS due to their expanding along the a and b axes caused by the misfit dislocations was detected using X-ray diffraction.
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页码:509 / 512
页数:4
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