HFAL3 GROWTH KINETICS IN THIN-FILMS AND RELATIONSHIP TO OTHER AL-TRANSITION METAL REACTIONS

被引：0
|
作者：
HOWARD, JK [1 ]
SMITH, PJ [1 ]
FICALORA, P [1 ]
机构：
[1] IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 08期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C288 / C288
页数：1
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