INSITU OBSERVATION OF DISLOCATION BEHAVIORS IN MELTING PROCESS OF ALUMINUM BY HIGH-VOLTAGE ELECTRON-MICROSCOPY

被引：4

作者：

FUJITA, H

TABATA, T

AOKI, T

机构：

[1] OSAKA UNIV,FAC ENGN,DEPT MAT SCI & ENGN,SUITA,OSAKA 565,JAPAN

[2] OSAKA UNIV,ULTRA HIGH VOLTAGE EM RES CTR,SUITA,OSAKA 565,JAPAN

[3] OSAKA UNIV,GRAD SCH,SUITA,OSAKA 565,JAPAN

来源：

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN | 1977年 / 42卷 / 04期

关键词：

D O I：

10.1143/JPSJ.42.1429

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：1429 / 1430

页数：2

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