VORTEX FLOW CHARACTERISTICS OF HIGH-T-C, FLUX-FLOW TRANSISTORS

被引:25
|
作者
MIYAHARA, K
KUBO, S
SUZUKI, M
机构
[1] NTT Interdisciplinary Research Laboratories, Ibaraki 319-11
关键词
D O I
10.1063/1.355865
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-T-c superconducting flux flow transistors were fabricated from thin films of coevaporated YBaCuO. The vortex flow characteristics of the devices were experimentally investigated. The flow velocity of a vortex along a channel was measured from the applied magnetic field dependence of the I-V characteristics. It is 3.6-6.9X10(5) m/s when the bias current is 3-6 mA. This value is of the same order as that of a Josephson vortex flowing along a barrier region in a super-normal-super junction, and more than three orders of magnitude larger than that in type-II metal superconducting thin films.
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页码:404 / 407
页数:4
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