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NEAR THRESHOLD 4D PHOTOEXCITATION AND PHOTOIONIZATION OF XE
被引:37
|作者:
WHITFIELD, SB
CALDWELL, CD
HUANG, DX
KRAUSE, MO
机构:
[1] BEIJING SYNCHROTRON RADIAT LAB,INST HIGH ENERGY PHYS,BEIJING 100039,PEOPLES R CHINA
[2] OAK RIDGE NATL LAB,DIV CHEM,OAK RIDGE,TN 37831
关键词:
D O I:
10.1088/0953-4075/25/22/012
中图分类号:
O43 [光学];
学科分类号:
070207 ;
0803 ;
摘要:
The angular distribution parameter beta of the N5-O2,3O2,3 Auger lines has been measured between the 4d5/2 and the 4d3/2 thresholds of Xe using the cis technique. The radiationless decay parameter alpha2 for each of the N5-O2,3O2,3 Auger lines and the alignment parameter A20 for the intermediate ion were also determined. Comparisons with previous values of beta and alpha2 for the N5-O2,3O2,3 Auger lines have been made. In addition, shakeoff to the various states of the Xe2+ 5p4 ion has been measured following 4d photoexcitation and found to be small. These results support the contention that near-zero kinetic energy electrons observed following similar photoexcitation in the rare gases result primarily from a two-step process rather than the direct process of shakeoff.
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页码:4755 / 4771
页数:17
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