DIFFRACTION EFFECTS AT MIRROR INHOMOGENEITY OF MULTIBEAM INTERFEROMETER

被引：0
|
作者：
BELINSKIJ, AV
CHIRKIN, AS
机构：
来源：
IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII RADIOFIZIKA | 1986年 / 29卷 / 10期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1200 / 1203
页数：4
相关论文
共 50 条
  • [1] DIFFRACTION EFFECTS AT MIRROR IRREGULARITIES IN A MULTIBEAM INTERFEROMETER.
    Belinskii, A.V.
    Chirkin, A.S.
    Radiophysics and quantum electronics, 1986, 29 (10) : 911 - 914
  • [2] DIFFRACTION THEORY OF A MULTIBEAM INTERFEROMETER
    BELINSKIY, AV
    CHIRKIN, AS
    VESTNIK MOSKOVSKOGO UNIVERSITETA SERIYA 3 FIZIKA ASTRONOMIYA, 1986, 27 (04): : 53 - 58
  • [3] Interference and diffraction effects in folding mirror schlieren diffraction interferometer
    R. Kumar
    Applied Physics B, 2008, 93 : 415 - 420
  • [4] Interference and diffraction effects in folding mirror schlieren diffraction interferometer
    Kumar, R.
    APPLIED PHYSICS B-LASERS AND OPTICS, 2008, 93 (2-3): : 415 - 420
  • [5] DIFFRACTION THEORY OF A MULTIBEAM INTERFEROMETER.
    Belinskii, A.V.
    Chirkin, A.S.
    Moscow University Physics Bulletin (English Translation of Vestnik Moskovskogo Universiteta, Fizik, 1986, 41 (1986): : 62 - 67
  • [6] Diffraction Lloyd mirror interferometer
    Kumar R.
    Journal of Optics, 2010, 39 (2) : 90 - 101
  • [7] Erratum to: Diffraction Lloyd mirror interferometer
    Raj Kumar
    Journal of Optics, 2013, 42 (3) : 291 - 291
  • [8] Folding mirror schlieren diffraction interferometer
    Kumar, Raj
    Chhachhia, D. P.
    Aggarwal, A. K.
    APPLIED OPTICS, 2006, 45 (26) : 6708 - 6711
  • [9] Accuracy evaluation of point diffraction interferometer for EUVL mirror
    Otaki, K
    Ota, K
    Yamamoto, T
    Fukuda, Y
    Nishiyama, I
    Okazaki, S
    MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS, 2001, : 290 - 291
  • [10] Aspherical mirror measurement using a point diffraction interferometer
    Ota, K
    Yamamoto, T
    Fukuda, Y
    Otaki, K
    Nishiyama, I
    Okazaki, S
    EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2, 2002, 4688 : 690 - 694
12345