CHARACTERIZATION OF AMORPHOUS-SILICON FILMS BY RUTHERFORD BACKSCATTERING SPECTROMETRY

被引：16
|
作者：
KUBOTA, K
IMURA, T
IWAMI, M
HIRAKI, A
SATOU, M
FUJIMOTO, F
HAMAKAWA, Y
MINOMURA, S
TANAKA, K
机构：
[1] UNIV TOKYO,COLL GEN EDUC,TOKYO 153,JAPAN
[2] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
[3] UNIV TOKYO,INST SOLID STATE PHYS,TOKYO 106,JAPAN
[4] ELECTROTECH LAB,TANASHI,TOKYO 188,JAPAN
[5] GOVT IND RES INST,IKEDA,OSAKA 563,JAPAN
来源：
NUCLEAR INSTRUMENTS & METHODS | 1980年 / 168卷 / 1-3期
关键词：
D O I：
10.1016/0029-554X(80)91255-0
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：211 / 215
页数：5
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