NEW METHOD FOR MEASURING EXTREMELY LOW OPTICAL ABSORPTIONS

被引:6
|
作者
BUBENZER, A
HUNKLINGER, S
DRANSFELD, K
机构
关键词
D O I
10.1016/0022-3093(80)90134-9
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:605 / 610
页数:6
相关论文
共 50 条
  • [1] QUASI-OPTICAL METHOD FOR MEASURING EXTREMELY LOW DIELECTRIC LOSS IN CONDENSED MEDIA AT LOW-TEMPERATURES
    GANAPOLSKII, EM
    GOLIK, AV
    KOROLYUK, AP
    [J]. FIZIKA NIZKIKH TEMPERATUR, 1993, 19 (11): : 1255 - 1259
  • [2] FREQUENCY-MODULATION SPECTROSCOPY - NEW METHOD FOR MEASURING WEAK ABSORPTIONS AND DISPERSIONS
    BJORKLUND, GC
    [J]. OPTICS LETTERS, 1980, 5 (01) : 15 - 17
  • [3] USE OF AN INTEGRATING CAVITY FOR MEASURING SMALL OPTICAL ABSORPTIONS
    EMELYANOV, AM
    KOSYAKOV, VI
    MAKUSHKIN, BV
    [J]. SOVIET JOURNAL OF OPTICAL TECHNOLOGY, 1978, 45 (01): : 31 - 33
  • [4] A DOUBLE AC METHOD FOR MEASURING EXTREMELY LOW HALL MOBILITIES
    PARKER, DL
    [J]. TEXAS JOURNAL OF SCIENCE, 1967, 19 (04): : 406 - &
  • [5] USE OF AN INTEGRATING CAVITY FOR MEASURING SMALL OPTICAL ABSORPTIONS.
    Emel'yanov, A.M.
    Kosyakov, V.I.
    Makushkin, B.V.
    [J]. 1978, 45 (01): : 31 - 33
  • [6] Measuring extremely low defect levels
    Russell, EL
    [J]. AMERICAN STATISTICAL ASSOCIATION - 1996 PROCEEDINGS OF THE SECTION ON QUALITY AND PRODUCTIVITY, 1996, : 91 - 95
  • [7] Measuring of harmonics with extremely low amplitudes
    Xie, J.
    Hasenkopf, D.
    Schmid, R.
    [J]. eb - Elektrische Bahnen, 2001, 99 (6-7): : 277 - 283
  • [8] A new method for measuring the isolation of optical isolator
    Zhu Liangqin
    Zhu Jiangjie
    Cheng Xueping
    [J]. 2017 OPTO-ELECTRONICS AND COMMUNICATIONS CONFERENCE (OECC) AND PHOTONICS GLOBAL CONFERENCE (PGC), 2017,
  • [9] Measuring of harmonics with extremely low amplitudes
    Xie, J
    Hasenkopf, D
    [J]. IEEE/PES TRANSMISSION AND DISTRIBUTION CONFERENCE AND EXHIBITION 2002: ASIA PACIFIC, VOLS 1-3, CONFERENCE PROCEEDINGS: NEW WAVE OF T&D TECHNOLOGY FROM ASIA PACIFIC, 2002, : 2267 - 2272
  • [10] A METHOD FOR MEASURING EXTREMELY SMALL NON-UNIFORMITIES IN THE OPTICAL THICKNESS OF EVAPORATED FILMS
    GEE, AE
    POLSTER, HD
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1949, 39 (12) : 1044 - 1047