THE DYNAMIC GRADIENT FREEZE GROWTH OF (TI+ZN) DOPED SEMI-INSULATING INP

被引:1
|
作者
MONBERG, EM
BARNS, RL
BRIDENBAUGH, PM
BROWN, H
CARTER, A
机构
[1] AT and T Bell Laboratories, 600 Mountain Ave., Murray Hill
关键词
D O I
10.1016/0921-5107(90)90110-W
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High quality single crystals of semi-insulating InP were grown by the electrodynamic gradient freeze technique. The material is co-doped with the shallow acceptor zinc and the deep donor titanium. Resistivities in the 105-106 Ω cm range were measured with corresponding mobilities of 2500 cm2 V-1s-1. Variable temperature Hall measurements resulted in an activation energy 0.61 ± 0.03 eV below the conduction band. The dislocation density is less than 500 cm-2 and is the lowest ever reported for comparably sized semi-insulating InP bulk crystals. Precipitates containing titanium and phosphorus were found when the titatium concentration exceeded 3 × 1016 cm-3. A distribution coefficient of 4 × 10-4 was measured for titanium in InP. The precipitates have been identified for the first time as hexagonal TiP using X-ray powder diffraction. © 1990.
引用
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页码:29 / 32
页数:4
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