MIGRATION OF OXYGEN DURING ANODIC-OXIDATION OF TANTALUM

被引:68
|
作者
PRINGLE, JPS [1 ]
机构
[1] ATOM ENERGY CANADA LTD,CHALK RIVER NUCL LABS,CHALK RIVER,ONTARIO,CANADA
关键词
D O I
10.1149/1.2403268
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1391 / 1400
页数:10
相关论文
共 50 条
  • [1] MIGRATION OF TANTALUM ATOMS DURING ANODIC-OXIDATION OF TANTALUM
    PRINGLE, JPS
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C133 - C133
  • [2] TRANSPORT NUMBERS OF METAL AND OXYGEN DURING ANODIC-OXIDATION OF TANTALUM
    PRINGLE, JPS
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (03) : 398 - 407
  • [3] ANODIC-OXIDATION OF SINTERED TANTALUM
    CLIMENT, F
    CAPELLADES, R
    GARCIA, E
    GIL, J
    THIN SOLID FILMS, 1994, 238 (01) : 79 - 82
  • [4] ANODIC-OXIDATION OF TANTALUM SILICIDE
    MARTINEZDUART, JM
    FERNANDEZ, M
    PAULE, E
    CLIMENT, A
    ALBELLA, JM
    PERRIERE, J
    SIEJKA, J
    APPLIED PHYSICS LETTERS, 1985, 47 (06) : 579 - 581
  • [5] ANODIC-OXIDATION OF TANTALUM SINTERBODIES
    CLIMENT, F
    CAPELLADES, R
    GARCIA, E
    GIL, J
    ANALES DE QUIMICA SERIE B-QUIMICA INORGANICA Y QUIMICA ANALYTICA, 1987, 83 (02): : 168 - 171
  • [6] ELECTRON INJECTION AND AVALANCHE DURING THE ANODIC-OXIDATION OF TANTALUM
    ALBELLA, JM
    MONTERO, I
    MARTINEZDUART, JM
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (05) : 1101 - 1104
  • [7] TRANSPORT PROCESSES DURING THE ANODIC-OXIDATION OF TANTALUM AND NIOBIUM
    ODYNETS, LL
    SOVIET ELECTROCHEMISTRY, 1984, 20 (04): : 435 - 441
  • [8] PREPARATION OF ISOTOPIC OXYGEN TARGETS VIA ANODIC-OXIDATION OF TANTALUM
    PHILLIPS, D
    PRINGLE, JPS
    NUCLEAR INSTRUMENTS & METHODS, 1976, 135 (02): : 389 - 390
  • [9] MOVEMENTS OF OXYGEN DURING ANODIC-OXIDATION OF SUPERIMPOSED METALLIC-FILMS OF NIOBIUM AND TANTALUM
    PERRIERE, J
    RIGO, S
    SIEJKA, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C133 - C133
  • [10] CATION MIXING DURING ANODIC-OXIDATION OF TANTALUM SUPERIMPOSED ON GAAS
    CANADAY, JD
    FISCHER, CW
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (08) : C319 - C319