DYNAMICS OF PULSED CO2-LASER ANNEALING OF SILICON

被引：18
|
作者：
BHATTACHARYYA, A [1 ]
STREETMAN, BG [1 ]
机构：
[1] UNIV ILLINOIS,DEPT ELECT ENGN,URBANA,IL 61801
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1981年 / 14卷 / 05期
关键词：
D O I：
10.1088/0022-3727/14/5/002
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L67 / L72
页数：6
相关论文
共 50 条
  • [1] ANNEALING OF IMPLANTED LAYERS OF SILICON BY PULSED CO2-LASER RADIATION
    GALIAUTDINOV, MF
    DANILEIKO, IK
    ZARIPOV, MM
    MANENKOV, AA
    SIDORIN, AV
    KHAIBULLIN, IB
    SHTYRKOV, EI
    [J]. DOKLADY AKADEMII NAUK SSSR, 1981, 257 (05): : 1110 - 1113
  • [2] THEORETICAL CONSIDERATIONS REGARDING PULSED CO2-LASER ANNEALING OF SILICON
    BHATTACHARYYA, A
    STREETMAN, BG
    [J]. SOLID STATE COMMUNICATIONS, 1980, 36 (08) : 671 - 675
  • [3] CO2-LASER ANNEALING OF SILICON
    NAUKKARINEN, K
    TUOMI, T
    BLOMBERG, M
    LUOMAJARVI, M
    RAUHALA, E
    [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (08) : 5634 - 5640
  • [4] PULSED CO2-LASER ANNEALING OF SEMICONDUCTORS
    JAMES, RB
    [J]. SEMICONDUCTORS AND SEMIMETALS, 1984, 23 : 555 - 623
  • [5] PULSED EXCIMER AND CO2-LASER ANNEALING OF ION-IMPLANTED SILICON
    NARAYAN, J
    JAMES, RB
    HOLLAND, OW
    AZIZ, MJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (04): : 1836 - 1838
  • [6] DYNAMICS OF CO2-LASER HEATING IN THE PROCESSING OF SILICON
    SIREGAR, MRT
    LUTHY, W
    AFFOLTER, K
    [J]. APPLIED PHYSICS LETTERS, 1980, 36 (10) : 787 - 788
  • [7] PHOTOIONIZATION IN PULSED CO2-LASER
    BORISOV, VM
    GLADUSH, GG
    STEPANOV, YY
    [J]. KVANTOVAYA ELEKTRONIKA, 1977, 4 (04): : 809 - 814
  • [8] ANNEALING OF BORON-IMPLANTED SILICON USING A CW CO2-LASER
    TSIEN, PH
    TSOU, SC
    TAKAI, M
    ROSCHENTHALER, D
    RAMIN, M
    RYSSEL, H
    RUGE, I
    WITTMAACK, K
    [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1981, 63 (02): : 547 - 555
  • [9] ANNEALING OF PHOSPHORUS-ION-IMPLANTED SILICON USING A CO2-LASER
    MIYAO, M
    OHYU, K
    TOKUYAMA, T
    [J]. APPLIED PHYSICS LETTERS, 1979, 35 (03) : 227 - 229
  • [10] CW CO2-LASER ANNEALING OF BORON-DOPED POLYCRYSTALLINE SILICON
    AROLE, VM
    TAKWALE, MG
    OGALE, SB
    BHIDE, VG
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1988, 21 (12) : 1761 - 1763
12345