DIODE AND HOLLOW-CATHODE ETCHING IN CF4

被引：16
|
作者：
DAVIES, KE
HORWITZ, CM
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 04期
关键词：
D O I：
10.1116/1.575778
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2705 / 2708
页数：4
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