0.25-MU-M PERIODIC STRUCTURES FOR LIGHTWAVE TECHNOLOGY FABRICATED BY SPATIAL-FREQUENCY DOUBLING LITHOGRAPHY (SFDL)

被引：0
|
作者：
JEWELL, TE
BENNEWITZ, JH
POL, V
CIRELLI, R
机构：
来源：
OPTICAL/LASER MICROLITHOGRAPHY II | 1989年 / 1088卷
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：496 / 503
页数：8
相关论文
共 6 条
  • [1] SPATIAL-FREQUENCY DOUBLING LITHOGRAPHY (SFDL) OF PERIODIC STRUCTURES FOR INTEGRATED OPTICAL CIRCUIT TECHNOLOGY
    JEWELL, TE
    WHITE, DL
    JOURNAL OF LIGHTWAVE TECHNOLOGY, 1989, 7 (09) : 1386 - 1393
  • [2] SPATIAL-FREQUENCY DOUBLING METHOD FOR SUB-0.15-MU-M OPTICAL LITHOGRAPHY
    OTAKA, A
    KAWAI, Y
    TANAKA, A
    MATSUDA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1995, 34 (5A): : L594 - L596
  • [3] A 0.25-MU-M BICMOS TECHNOLOGY USING SOR X-RAY-LITHOGRAPHY
    KONAKA, S
    KYURAGI, H
    KOBAYASHI, T
    DEGUCHI, K
    YAMAMOTO, E
    OHKI, S
    YAMAMOTO, Y
    IEICE TRANSACTIONS ON ELECTRONICS, 1994, E77C (03) : 355 - 361
  • [4] 0.25-MU-M LITHOGRAPHY USING 248-NM STEP-AND-SCAN TECHNOLOGY
    ELDER, GB
    LITT, LC
    MALTABES, JG
    SOLID STATE TECHNOLOGY, 1995, 38 (06) : 51 - &
  • [5] A SCALED 0.25-MU-M BIPOLAR TECHNOLOGY USING FULL E-BEAM LITHOGRAPHY
    CRESSLER, JD
    WARNOCK, J
    COANE, PJ
    CHIONG, KN
    ROTHWELL, ME
    JENKINS, KA
    BURGHARTZ, JN
    PETRILLO, EJ
    MAZZEO, NJ
    MEGDANIS, AC
    HOHN, FJ
    THOMSON, MG
    SUN, JYC
    TANG, DD
    IEEE ELECTRON DEVICE LETTERS, 1992, 13 (05) : 262 - 264
  • [6] Spatial frequency doubling method by image superimposition for sub-0.15-mu m optical lithography
    Otaka, A
    Kawai, Y
    Tanaka, A
    Matsuda, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1995, 34 (12A): : 6518 - 6525
1