RADIO-FREQUENCY SPUTTER DEPOSITION OF BORON-NITRIDE BASED THIN-FILMS

被引：40
|
作者：
MITTERER, C
RODHAMMER, P
STORI, H
JEGLITSCH, F
机构：
[1] MET WERK PLANSEE GMBH,A-6600 REUTTE,AUSTRIA
[2] VIENNA TECH UNIV,INST ALLGEMEINE PHYS,A-1040 VIENNA,AUSTRIA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 04期
关键词：
D O I：
10.1116/1.575767
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2646 / 2651
页数：6
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