STUDY OF BORON-NITRIDE DEPOSITION PROCESS FROM DIBORANE AND AMMONIA GAS-MIXTURES

被引：5
|
作者：
ESSAFTI, A
GOMEZALEIXANDRE, C
ALBELLA, JM
机构：
[1] Instituto de Ciencia de Materiales (CSIC), Universidad Autónoma Madrid, C-XII, Cantoblanco
来源：
VACUUM | 1994年 / 45卷 / 10-11期
关键词：
D O I：
10.1016/0042-207X(94)90014-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Boron nitride, in powder and thin film forms, has been obtained by chemical vapour deposition (CVD) from diborane and ammonia gas mixtures in a hot-wall reactor. Pressure, temperature and flow-ratio effects on the deposition reaction and films characteristics have been studied by infrared (ir) spectroscopy. In the ir spectra, besides the B-N band at 1380 cm(-1), the peak at 2520 cm(-1) corresponding to the B-H stretching vibration and N-H band at 3300 cm(-1) have been detected. In the 600-850 degrees C temperature range, the position of the main peak (B-N) does not change, but the deposition rate is noticeably affected by the deposition temperature.
引用
收藏
页码：1029 / 1030
页数：2
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