DETERMINATION OF ELECTRON-TEMPERATURE IN ION PLATING DISCHARGES BY OPTICAL-EMISSION SPECTROSCOPY

被引:9
|
作者
FANCEY, KS
MATTHEWS, A
机构
[1] Research Centre in Surface Engineering, Department of Engineering Design and Manufacture, University of Hull, Hull
关键词
D O I
10.1016/0042-207X(91)90010-G
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
By the use of Optical Emission Spectroscopy (OES), the electron temperature, T(e), is estimated for argon based dc diode and thermionic triode discharge plasmas. In addition, the dependence of T(e) on the presence of electron beam evaporated titanium in the plasma is investigated. The difficulties associated with calibration when determining T(e) by OES are highlighted; the uncertainties influence calculated T(e) values in relative and absolute terms. Nevertheless, our results indicate that (i) T(e) may rise when discharge enhancement by thermionic emission is utilised, and (ii) T(e) could be increased significantly by metal evaporation. The implications of these findings are discussed.
引用
收藏
页码:1013 / 1015
页数:3
相关论文
共 50 条
  • [1] PROCESS-CONTROL WITH OPTICAL-EMISSION SPECTROSCOPY IN TRIODE ION PLATING
    SALMENOJA, K
    KORHONEN, AS
    SULONEN, MS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2364 - 2367
  • [2] THE ELECTRON-TEMPERATURE AND OPTICAL-EMISSION STRUCTURE OF THE CENTRAL COMPONENT OF CTB-80
    BLAIR, WP
    FESEN, RA
    BECKER, RH
    ASTRONOMICAL JOURNAL, 1988, 96 (03): : 1011 - &
  • [3] OPTICAL-EMISSION SPECTROSCOPY OF SILANE ARGON MAGNETRON DISCHARGES
    SUCHANECK, G
    MONCH, JP
    SCHADE, K
    PAUL, W
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 90 (1-3) : 323 - 326
  • [4] THE USE OF OPTICAL-EMISSION SPECTROSCOPY FOR PROCESS-CONTROL IN TRIODE ION PLATING WITH ZRN
    SALMENOJA, K
    KORHONEN, AS
    VACUUM, 1986, 36 (1-3) : 33 - 35
  • [5] Determination of the electron temperature profile above the evaporative source in an ion plating discharge by spatially resolved optical emission spectroscopy
    Wilson, AD
    Davison, A
    Leyland, A
    Matthews, A
    Fancey, KS
    THIN SOLID FILMS, 2003, 434 (1-2) : 157 - 161
  • [6] ANALYSIS OF A REACTIVE SPUTTER ION PLATING DISCHARGE FOR TIN DEPOSITION USING OPTICAL-EMISSION SPECTROSCOPY
    RICARD, A
    MICHEL, H
    JACQUOT, P
    GANTOIS, M
    THIN SOLID FILMS, 1985, 124 (01) : 67 - 73
  • [7] SPATIOTEMPORAL OPTICAL-EMISSION SPECTROSCOPY OF RF DISCHARGES IN SF6
    PETROVIC, ZL
    TOCHIKUBO, F
    KAKUTA, S
    MAKABE, T
    JOURNAL OF APPLIED PHYSICS, 1993, 73 (05) : 2163 - 2172
  • [8] ON THE OPTICAL-EMISSION OF INHOMOGENEOUS SPUTTERING DISCHARGES
    WAUTELET, M
    HECQ, M
    DAUCHOT, JP
    DONY, MF
    LEGRAND, PB
    VACUUM, 1994, 45 (05) : 623 - 625
  • [9] DETERMINATION OF AUTOIONIZATION RATES BY MEANS OF OPTICAL-EMISSION SPECTROSCOPY
    MANNERVIK, S
    CEDERQUIST, H
    KISIELINSKI, M
    PHYSICA SCRIPTA, 1984, T8 : 107 - 111
  • [10] DETERMINATION OF CARBON BY DC ARC OPTICAL-EMISSION SPECTROSCOPY
    LOWRY, RK
    STRUBE, LR
    APPLIED SPECTROSCOPY, 1979, 33 (03) : 306 - 307