THE MICROSTRUCTURE OF DIRECTIONALLY QUENCHED PD-CU-SI ALLOYS

被引：0

作者：

BOETTINGER, WJ ^{[1
]}

BIANCANIELLO, FS ^{[1
]}

机构：

[1] NBS,DIV MET,WASHINGTON,DC 20234

来源：

JOURNAL OF METALS | 1981年 / 33卷 / 09期

关键词：

D O I：

暂无

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：A4 / A4

页数：1

共 50 条

[1] THE GLASS TEMPERATURES OF VARIOUSLY QUENCHED PD-CU-SI GLASSES
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[3] DIFFUSION IN A PD-CU-SI METALLIC GLASS
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[4] TRACER DIFFUSION IN AMORPHOUS PD-CU-SI
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[5] PD3SI NUCLEATION IN UNDERCOOLED PD-CU-SI MELTS
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[6] COMPUTER STUDY OF THE MISCIBILITY LIMITS OF PD-CU-SI
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[7] HYDROGEN RELATED INTERNAL-FRICTION PEAKS IN AMORPHOUS AND CRYSTALLIZED PD-CU-SI ALLOYS
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[8] Composition Control of Pd-Cu-Si Metallic Glassy Alloys for Thin Film Hydrogen Sensor
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[9] COMPUTER-SIMULATION OF INFLEXION POINTS IN MISCIBILITY GAPS WITH REFERENCE TO PD-CU-SI ALLOYS
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[10] CRYSTALLIZATION OF AMORPHOUS PD-CU-SI ALLOY IN CREEP CONDITIONS
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