LASER ANNEALING OF ION-IMPLANTED SILICON

被引：0
|
作者：
WHITE, CW [1 ]
机构：
[1] OAK RIDGE NATL LAB,DIV SOLID STATE,OAK RIDGE,TN 37830
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C384 / C384
页数：1
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