DAMAGE PROFILE ON HIGH-ENERGY ION-IMPLANTED GAP

被引:8
|
作者
ASCHERON, C [1 ]
OTTO, G [1 ]
FLAGMEYER, R [1 ]
ZSCHAU, HE [1 ]
BUGROV, VN [1 ]
KARAMYAN, SA [1 ]
机构
[1] DUBNA JOINT NUCL RES INST,DUBNA,USSR
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关键词
D O I
10.1002/pssa.2210970137
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:K15 / K19
页数:5
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