PROPERTIES OF DC MAGNETRON REACTIVELY SPUTTERED TIN

被引：18
|
作者：
STIMMELL, J
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 06期
关键词：
D O I：
10.1116/1.583461
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：1377 / 1382
页数：6
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