PREPARATION AND PROPERTIES OF (PB,LA)(ZR,TI)O3 THIN-FILMS BY METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引:64
|
作者
OKADA, M
TOMINAGA, K
机构
[1] Department of Industrial Chemistry, Faculty of Engineering, Chubu University 1200, Matsumotocho Kasugai
关键词
D O I
10.1063/1.351190
中图分类号
O59 [应用物理学];
学科分类号
摘要
Lanthanum-modified lead zirconate titanate (PLZT) thin films have been grown on Pt/MgO(100) and Pt/SiO2/Si substrates at 650-degrees-C by metalorganic chemical vapor deposition using Pb(C2H5)4, La(DPM)3, Zr(DPM)4 and Ti(i - OC3H7)4 as the source materials. The properties of PLZT films were investigated as a function of the La content in a range of 0-15 at.% with a composition ratio of Zr/(Zr + Ti) < 0.5. The films were of a single perovskite structure, and highly oriented to the c axis of the tetragonal phase on a Pt/MgO(100) substrate. The films were transformed from tetragonal to nearly cubic as the La content was increased. The films were colorless and transparent, and the surface morphology became smoother through an La addition. The relative dielectric constants increased as the La content was increased up to about 5 at.%. The remanent polarizations were 25-30-mu-C/cm2, and the coercive field decreased from 53 to 30 kV/cm as the La content was increased in the films having Zr/Ti = 40/60.
引用
收藏
页码:1955 / 1959
页数:5
相关论文
共 50 条
  • [1] PREPARATION AND EVALUATION OF PB(ZR.TI)O3 THIN-FILMS BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    TOMONARI, H
    ISHIU, T
    SAKATA, K
    TAKENAKA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (9B): : 2998 - 3000
  • [2] GROWTH OF PB(ZR, TI)O3 THIN-FILMS BY PHOTOENHANCED CHEMICAL VAPOR-DEPOSITION AND THEIR PROPERTIES
    KATAYAMA, T
    SUGIYAMA, M
    SHIMIZU, M
    SHIOSAKI, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (9B): : 3005 - 3008
  • [3] PREPARATION OF PB(ZR, TI)O3 THIN-FILMS USING ALL DIPIVALOYLMETHANE SOURCE MATERIALS BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    YAMAZAKI, H
    TSUYAMA, T
    KOBAYASHI, I
    SUGIMORI, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (9B): : 2995 - 2997
  • [4] Preparation and evaluation of Pb(Zr·Ti)O3 thin films by metalorganic chemical vapor deposition
    Tomonari, Hajime
    Ishiu, Takehiko
    Sakata, Koichiro
    Takenaka, Tadashi
    1600, (31):
  • [5] METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF FERROELECTRIC PB(ZR,TI)O3 THIN-FILMS
    PENG, CH
    DESU, SB
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1994, 77 (07) : 1799 - 1812
  • [6] SWITCHING AND FATIGUE CHARACTERISTICS OF (PB, LA)(ZR, TI)O3 THIN-FILMS BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    TOMINAGA, K
    SHIRAYANAGI, A
    TAKAGI, T
    OKADA, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (9B): : 4082 - 4085
  • [7] Metalorganic chemical vapor deposition of ferroelectric Pb(Zr,Ti)O3 thin films
    Peng, Chien H., 1799, American Ceramic Soc, Westerville, OH, United States (77):
  • [9] PREPARATION AND ELECTRICAL-PROPERTIES OF FERROELECTRIC (PB,LA)(ZR,TI)O-3 THIN-FILMS BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    TOMINAGA, K
    SAKASHITA, Y
    NAKASHIMA, H
    OKADA, M
    JOURNAL OF CRYSTAL GROWTH, 1994, 145 (1-4) : 219 - 225
  • [10] Preparation and characterization of Pb(Nb,Ti)O3 thin films by metalorganic chemical vapor deposition
    Matsuzaki, T
    Funakubo, H
    JOURNAL OF APPLIED PHYSICS, 1999, 86 (08) : 4559 - 4564