IMMERSION LIQUIDS OF HIGH REFRACTIVE INDEX

被引：0
|
作者：
MEYROWITZ, R
LARSEN, ES
机构：
来源：
AMERICAN MINERALOGIST | 1951年 / 36卷 / 9-10期
关键词：
D O I：
暂无
中图分类号：
P3 [地球物理学]; P59 [地球化学];
学科分类号：
0708 ; 070902 ;
摘要：
引用
收藏
页码：746 / 750
页数：5
相关论文
共 50 条
  • [1] IMMERSION LIQUIDS OF HIGH REFRACTIVE INDEX
    MEYROWITZ, R
    LARSEN, ES
    [J]. GEOLOGICAL SOCIETY OF AMERICA BULLETIN, 1950, 61 (12) : 1486 - 1486
  • [2] IMMERSION LIQUIDS OF HIGH REFRACTIVE INDEX
    MEYROWITZ, R
    LARSEN, ES
    [J]. AMERICAN MINERALOGIST, 1951, 36 (3-4) : 321 - 321
  • [3] Immersion liquids of high refractive index
    West, CD
    [J]. AMERICAN MINERALOGIST, 1936, 21 (04) : 245 - 249
  • [4] Liquids of high refractive index
    Anderson, BW
    Payne, CJ
    [J]. NATURE, 1936, 138 : 168 - 168
  • [5] Liquids of high refractive index
    Anderson, BW
    Payne, CJ
    [J]. NATURE, 1934, 133 : 66 - 67
  • [6] High Refractive Index Nanocomposite Fluids for Immersion Lithography
    Bremer, L.
    Tuinier, R.
    Jahromi, S.
    [J]. LANGMUIR, 2009, 25 (04) : 2390 - 2401
  • [7] High refractive index immersion fluids for 193nm immersion lithography
    Budhlall, B
    Parris, G
    Zhang, P
    Gao, XP
    Zarkov, Z
    Ross, B
    Kaplan, S
    Burnett, J
    [J]. Optical Microlithography XVIII, Pts 1-3, 2005, 5754 : 622 - 629
  • [8] ARSENIC TRIBROMIDE IMMERSION LIQUIDS OF HIGH INDEX OF REFRACTION
    MEYROWITZ, R
    [J]. SCIENCE, 1955, 122 (3183) : 1272 - 1272
  • [9] High refractive index material design for ArF immersion lithography
    Furukawa, Taiichi
    Kishida, Takanori
    Miyamatsu, Takashi
    Kawaguchi, Kazuo
    Yamada, Kinji
    Tominaga, Tetsuo
    Slezak, Mark
    Hieda, Katsuhiko
    [J]. ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519
  • [10] The use of nanocomposite materials for high refractive index immersion lithography
    Zimmerman, Paul A.
    Rice, Bryan
    Rodriguez, Robert
    Zettel, Michael F.
    Trikeriotis, Markos
    Wang, Dongyan
    Yi, Yi
    Bae, Woo Jin
    Ober, Christopher K.
    Giannelis, Emmanuel P.
    [J]. JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2008, 21 (05) : 621 - 629
12345