ELECTROCHEMICAL-ELLIPSOMETRIC STUDIES OF OXIDE FILM FORMED ON NICKEL DURING OXYGEN EVOLUTION

被引：220
|
作者：
LU, PWT [1 ]
SRINIVASAN, S [1 ]
机构：
[1] BROOKHAVEN NATL LAB,DEPT APPL SCI,UPTON,NY 11973
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 09期
关键词：
D O I：
10.1149/1.2131689
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1416 / 1422
页数：7
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