MEASUREMENT OF PARAMETERS OF A HIGH-FREQUENCY PLASMA BY LASER SCATTERING

被引：0
|
作者：
GRUZDEV, VA [1 ]
PETROV, GD [1 ]
机构：
[1] ALL UNION ENGN PHYS & RADIOENGN MEASUREMENT RES INST,MOSCOW,USSR
来源：
HIGH TEMPERATURE | 1974年 / 12卷 / 04期
关键词：
D O I：
暂无
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：795 / 797
页数：3
相关论文
共 50 条
  • [1] HIGH-FREQUENCY LASER INTERFEROMETRY IN PLASMA DIAGNOSTICS
    GERARDO, JB
    VERDEYEN, JT
    GUSINOW, MA
    [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (07) : 2146 - &
  • [2] THE EFFECT OF ENHANCED PLASMA-WAVES ON THOMSON SCATTERING WITH A HIGH-FREQUENCY PROBE LASER
    DRAKE, RP
    [J]. PHYSICS OF FLUIDS B-PLASMA PHYSICS, 1989, 1 (11): : 2291 - 2293
  • [3] COULOMB SCATTERING IN INTENSE, HIGH-FREQUENCY LASER FIELDS
    OFFERHAUS, MJ
    KAMINSKI, JZ
    GAVRILA, M
    [J]. PHYSICS LETTERS A, 1985, 112 (3-4) : 151 - 155
  • [4] HIGH-FREQUENCY SCATTERING
    WU, TT
    [J]. PHYSICAL REVIEW, 1956, 104 (05): : 1201 - 1212
  • [5] High-frequency permalloy permeability extracted from scattering parameters
    Wang, PS
    Ni, WP
    Tien, NC
    Kan, EC
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 95 (11) : 7034 - 7036
  • [6] MODIFIED COULOMB SCATTERING IN INTENSE, HIGH-FREQUENCY LASER FIELDS
    VANDEREE, J
    KAMINSKI, JZ
    GAVRILA, M
    [J]. PHYSICAL REVIEW A, 1988, 37 (11): : 4536 - 4539
  • [7] Research on measurement system of high-frequency parameters for line traps
    [J]. Cao, W. (eegscaows@ncwu.edu.cn), 1600, Universitas Ahmad Dahlan, Jalan Kapas 9, Semaki, Umbul Harjo,, Yogiakarta, 55165, Indonesia (11):
  • [8] HIGH-FREQUENCY PARAMETERS OF BULK CONDUCTIVITY DEVICES WITH PLASMA RESONANCE
    LUBCHENKO, VE
    [J]. RADIOTEKHNIKA I ELEKTRONIKA, 1977, 22 (11): : 2448 - 2450
  • [9] Plasma parameters and tungsten sputter rates in a high-frequency CCP
    Sackers, M.
    Busch, C.
    Tsankov, Ts. V.
    Czarnetzki, U.
    Mertens, Ph.
    Marchuk, O.
    [J]. PHYSICS OF PLASMAS, 2022, 29 (04)
  • [10] HIGH-FREQUENCY DIELECTRIC RESONANCE PROBE FOR MEASUREMENT OF PLASMA DENSITIES
    MESSIAEN, AM
    VANDENPLAS, PE
    [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (04) : 1718 - +
12345