THE STABILITY OF FRENKEL PAIRS AND GROUP-V INTERSTITIALS IN ELECTRON-IRRADIATED GAAS AND GAP

被引:12
|
作者
MURRAY, R
NEWMAN, RC
WOODHEAD, J
机构
[1] Univ of Reading, Reading, Engl, Univ of Reading, Reading, Engl
关键词
ATOMS - Diffusion - ELECTRON BEAMS - INFRARED RADIATION - Absorption - SEMICONDUCTING GALLIUM COMPOUNDS - Radiation Effects;
D O I
10.1088/0268-1242/2/7/002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
B//G//a impurity atoms selectively trap mobile group V interstitials to form defects designated B(1) centres in both GaAs and GaP during 2 MeV electron irradiation at room temperature. The production of these centres has been measured in both n-type and p-type material by infrared absorption and compared with a model proposed by Pons and Bourgoin relating to radiation-enhanced diffusion of the interstitial atoms. Our results imply, however, that the dissociation of Frenkel pairs produced on the group V sublattice as primary defects controls the process. The Frenkel pairs are stable in n-type material but not in p-type or high-resistivity material.
引用
收藏
页码:399 / 403
页数:5
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