PHOTORESIST OUTGASSING AND CARBONIZATION DURING HIGH-ENERGY ION-IMPLANTATION

被引:5
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作者
OCONNOR, JP
RILEY, JT
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D O I
10.1016/0921-5107(89)90093-7
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T [工业技术];
学科分类号
08 ;
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页码:177 / 182
页数:6
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