A STUDY OF MICROSTRUCTURE EDGES WITH ATOMIC-FORCE MICROSCOPY AND IMPLICATIONS FOR OPTICAL METROLOGY

被引：0
|
作者：
GEUTHER, H
MIRANDE, W
SCHRODER, KP
机构：
来源：
MICROELECTRONIC ENGINEERING | 1994年 / 23卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(94)90184-8
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Microstructures on photomasks and Si-wafers have been studied by means of optical and atomic force microscopy (AFM). We present examples for relations between edge topography and optical properties, which are relevant to optical metrology.
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页码：407 / 410
页数：4
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