PLENARY LECTURE - LOW-ENERGY ELECTRON-MICROSCOPY OF SURFACE PROCESSES

被引：18
|
作者：
BAUER, E
MUNDSCHAU, M
SWIECH, W
TELIEPS, W
机构：
[1] Physikalisches Institut, Technische Universität Clausthal
来源：
VACUUM | 1990年 / 41卷 / 1-3期
关键词：
D O I：
10.1016/0042-207X(90)90254-V
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
After a brief discussion of the basic features of low energy electron microscopy, the application of this technique to the study of processes on clean surfaces (Si(111)-(7 × 7)-(1 × 1) phase transition, Si(100) growth and sublimation) and in surface layers (Au and Cu on Si(111) and Mo(110)) is illustrated by video recordings. © 1990 Pergamon Press plc.
引用
收藏
页码：5 / 10
页数：6
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