TECHNOLOGY FOCUS - INSTRUMENTATION AND CONTROL

被引:0
|
作者
OCONNOR, L
机构
来源
MECHANICAL ENGINEERING | 1992年 / 114卷 / 01期
关键词
D O I
暂无
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
引用
收藏
页码:14 / 18
页数:5
相关论文
共 50 条
  • [1] TECHNOLOGY FOCUS - INSTRUMENTATION AND CONTROL
    VALENTI, M
    [J]. MECHANICAL ENGINEERING, 1993, 115 (05): : 20 - +
  • [2] FOCUS ON INSTRUMENTATION AND PROCESS CONTROL
    DYCK, AWJ
    [J]. AMERICAN PAPER INDUSTRY, 1969, 51 (12): : 31 - &
  • [3] INSTRUMENTATION, CONTROL AND INFORMATION TECHNOLOGY
    FINKELSTEIN, L
    [J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1986, 19 (04): : 246 - 247
  • [4] ADVANCED RESEARCH IN INSTRUMENTATION AND CONTROL TECHNOLOGY
    SHEEN, SH
    RAPTIS, AC
    [J]. PROCEEDINGS OF THE ADVANCED RESEARCH AND TECHNOLOGY DEVELOPMENT DIRECT UTILIZATION, INSTRUMENTATION AND DIAGNOSTICS CONTRACTORS REVIEW MEETING, VOLS 1 AND 2, 1989, : 618 - 631
  • [5] FOCUS MEASUREMENT AND CONTROL TECHNOLOGY
    HERDEN, F
    [J]. CHEMIE INGENIEUR TECHNIK, 1995, 67 (10) : 1258 - 1258
  • [6] Focus on Instrumentation
    David Y.H. Pui
    [J]. Journal of Nanoparticle Research, 2000, 2 : 3 - 4
  • [7] Focus on instrumentation
    Pui, David Y. H.
    [J]. JOURNAL OF NANOPARTICLE RESEARCH, 2000, 2 (01) : 3 - 4
  • [8] INSTRUMENTATION AND CONTROL TECHNOLOGY - ELECTRONIC, INTELLIGENT AND DECENTRALIZED
    URBACH, W
    [J]. SIEMENS REVIEW, 1979, 46 (05): : 11 - 19
  • [9] Focus Control Technology in Immersion Lithography
    Duan Chen
    Zong Mingcheng
    Fan Wei
    Meng Lulu
    [J]. ACTA OPTICA SINICA, 2018, 38 (09)
  • [10] Technology scorecard: Focus on infection control
    Beaumont, E
    [J]. AMERICAN JOURNAL OF NURSING, 1997, 97 (12) : 51 - 54