VELOCITY SATURATION IN THE COLLECTOR OF SI/GEXSI1-X/SI HBTS

被引:35
|
作者
COTTRELL, PE [1 ]
YU, ZP [1 ]
机构
[1] IBM CORP, DIV GEN TECHNOL, ESSEX JUNCTION, VT 05452 USA
关键词
D O I
10.1109/55.62986
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effects of velocity saturation on the unity gain-bandwidth product ft, and transconductance gm of n-p-n and p-n-p hetero-junction bipolar transistors (HBT’s) with GexSi1-x bases are described and simulated. For the n-p-n device, velocity saturation combined with a valence-band offset at the base-collector junction causes accelerated gm and ft, rolloff for current densities greater than the knee current for the Kirk effect. For the p-n-p device, the gm and ft, are degraded for all current densities. These limitations combine with the limits imposed by dislocation formation due to strain in the pseudomorphic layer to impose constraints on the design of Si/GexSi1-x/Si HBT's. © 1990 IEEE
引用
收藏
页码:431 / 433
页数:3
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