VERY INTENSE PULSED ELECTRON-BEAM

被引:0
|
作者
SANFORD, TWL
HALBLEIB, JA
WELCH, DR
MOCK, RC
机构
[1] Sandia National Laboratories, Albuquerque
关键词
D O I
10.1063/1.357114
中图分类号
O59 [应用物理学];
学科分类号
摘要
An intense beam of pulsed electrons has been developed using the extended planar-anode diode to extract and focus the HERMES-III beam in a low-pressure gas cell without anode destruction. Measurements and a simulation model are compared and found in good agreement for focal lengths of approximately 7-8 cm. They show that with this source a peak dose (peak dose rate) approximately 200 J/g (8 x 10(14) rad/s) in graphite can be generated with useful areas of 70 cm2. For the shorter focal length of approximately 11 cm, the model predicts that a peak dose (peak dose rate) of 3800 J/g (1.5 x 10(16) rad/s) can be generated over an area of 5 cm2.
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页码:569 / 576
页数:8
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