THE STUDY OF EPITAXIAL-GROWTH OF THIN CU AND AG LAYERS ON AG(110) AND CU(110) USING TOTAL CURRENT SPECTROSCOPY, AES AND WORK FUNCTION MEASUREMENT

被引：1
|
作者：
NAPARTY, MK
SKONIECZNY, J
机构：
[1] Institute of Mathematics and Physics, Academy of Technology and Agriculture, 85-790 Bydgoszcz
来源：
VACUUM | 1995年 / 46卷 / 02期
关键词：
D O I：
10.1016/0042-207X(94)E0038-Z
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The early stages of the growth of Cu layers deposited on Ag (110) and of Ag layers on Cu (110) have been studied by Total Current Spectroscopy, in conjunction with AES and Delta Phi measurements. The results are discussed in terms of structural properties of the substrate and the adsorbate layer. Information on the growth types, lattice relaxation and inner potential are extracted from experimental data.
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收藏
页码：189 / 194
页数：6
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