EPITAXIAL NICKEL AND COBALT SILICIDE FORMATION BY RAPID THERMAL ANNEALING

被引：15
|
作者：
CHEVALLIER, J
LARSEN, AN
机构：
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1986年 / 39卷 / 02期
关键词：
D O I：
10.1007/BF00616832
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：141 / 145
页数：5
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