ACTIVE OXIDATION PHENOMENA IN SILICON AND SILICON-BASED MATERIALS

被引：0
|
作者：
HINZE, JW
TRIPP, WC
GRAHAM, HC
机构：
[1] SYST RES LABS INC,DAYTON,OH
[2] AEROSP RES LABS,MET & CERAMICS RES LAB,WRIGHT PATTERSON AFB,OH
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1975年 / 122卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C94 / C94
页数：1
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