STRAIN-ENERGY CALCULATIONS OF SURFACE AND STEP STRUCTURES ON SILICON(111)

被引:2
|
作者
XU, ZW
CHEN, B
HANEMAN, D
机构
[1] School of Physics, university of New South Wales, Kensington, NSW 2033
关键词
D O I
10.1016/0039-6028(92)90082-H
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The Keating strain-energy method has been applied to estimate the energies of step structures on Si(111)2 X 1. Since angular strains are involved which go beyond the applicability limits, which are discussed, of the Keating formula, a correction factor is used, derived by comparing Keating-type calculations of particular surface models of Si(111) with the results of more extensive calculations. It is found that the use of a simple correction factor gives results that agree well with a calculation for the Pandey model and one for the three-bond scission model. Using this factor, a model for a 3-substep structure of the (322) step on Si is found to be quite stable, while the 2-substep structures are moderately stable.
引用
收藏
页码:451 / 459
页数:9
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