ANALYSIS OF RESIDUAL IMPURITIES INTRODUCED DURING SI-28 IMPLANTATION

被引：0
|
作者：
VASUDEV, PK [1 ]
JAMBA, DM [1 ]
WILSON, RG [1 ]
机构：
[1] HUGHES RES LABS,MALIBU,CA 90265
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 08期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C317 / C317
页数：1
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