LOW-TEMPERATURE PROCESS FOR TNT MANUFACTURE .2. PILOT-PLANT DEVELOPMENT

被引：0
|
作者：
HAAS, WR
FOCHTMAN, EG
CICIORA, L
YEE, D
机构：
[1] IIT RES INST, CHICAGO, IL 06016 USA
[2] PICATINNY ARSENAL, DOVER, NJ 07801 USA
来源：
ACS SYMPOSIUM SERIES | 1976年 / 22期
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：272 / 289
页数：18
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