EPITAXIAL-GROWTH OF ZNTE ON GASB(100) BY RF SPUTTERING

被引：3
|
作者：
TOKUMITSU, Y
KAWABUCHI, A
KITAYAMA, H
IMURA, T
OSAKA, Y
NISHIYAMA, F
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 02期
关键词：
D O I：
10.1063/1.343517
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：896 / 899
页数：4
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