CONDITIONING OF A DISTRIBUTED ION-PUMP

被引:2
|
作者
SUETSUGU, Y
机构
[1] National Laboratory for High Energy Physics, Tsukuba-shi, Ibaraki-ken, 305
关键词
D O I
10.1016/0042-207X(94)90354-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A conditioning procedure using N2 or Ar gas is applied to a distributed ion pump (DIP) of the TRISTAN accumulation ring. Effectiveness and problems of conditioning are experimentally investigated. Only a slight effect is observed in the N2 gas conditioning due to the great pressure difference along the beam duct, so that a uniform conditioning cannot be achieved. The Ar gas conditioning, on the other hand, well activates the DIP. Pumping speeds near the design value, congruent-to 80 l s-1 per meter at pressures congruent-to 1 x 10(-6) Pa, are obtained. The Ar component, however, increases after baking by more than a factor of 3 within 280 h. This increase makes it difficult to apply Ar gas conditioning to an accelerator ring.
引用
收藏
页码:133 / 137
页数:5
相关论文
共 50 条