Fe-N gradient thin films are fabricated by a facing targets sputtering (FIS) system. Rutherford backscattering spectrometry shows that the concentration of Fe atoms or N atoms varies gradually from the substrate to the surface of the film. The Fe-N gradient films contain crystal phases of xi-Fe2N, epsilon-FexN (2 < x less than or equal to 3), gamma'-Fe4N and alpha''-Fe16N2, and amorphous FeN as well, according to different sputtering conditions.